7–11 Apr 2025
Lecture and Conference Centre
Europe/Warsaw timezone

Process modeling-based optimization of grayscale masked stereolithography 3D printed parts

9 Apr 2025, 16:50
20m
Room 9

Room 9

Speaker

Felix Rutsch

Description

3D printing techniques based on the photopolymerization process stand out from other printing processes due to their high resolution. Applications include, for example, the fabrication of microfluidic devices and dental models. However, the dimensional conformity of the 3D printed objects is still a challenge. The properties and geometry are highly dependent on the process parameters.

In particular, using a grayscale masked stereolithography apparatus (gMSLA), a liquid polymer resin is selectively exposed to UV light in a layer-by-layer fashion to create three-dimensional structures. Using a projection LCD mask, the UV-light exposure of each point can be adjusted accurately by varying the local grayscale value. This determines where the material is cured or remains liquid within each layer.

A simulation of the printing process is developed, in order to get a deeper insight into the interaction of the relevant process parameters. This enables an accurate prediction of the geometry and material properties of the printed object.

The process model provides the basis for subsequent optimization. The input parameters, particularly the grayscale input, are optimized such that errors due to the printing process can be compensated. Thereby, the accuracy of the printed parts can be improved. Moreover, the optimization procedure can be integrated into topology optimization, such that the the grayscale mask input is used as design variable, directly.

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